High-temperature furnace PEO-604 Kurtz Ersa Semicon
High-temperature furnace for annealing, oxidation, polyimide application. The PEO-604 quartz tube furnace offers outstanding performance and versatility for demanding thermal applications. It is perfectly suited for research, pilot production and high volume production. Processes up to 50 wafers per run with a maximum wafer diameter of 200 mm are feasible. The high temperature furnace guarantees contaminationfree processing thanks to the easily exchangeable quartz liners, which prevent process to process cross-contamination.
Technical HighlightsPEO-604
- Space-saving thanks to small footprint
- Max. 50 wafers per process run
- Wafers up to Ø 200 mm
- No cross-contamination between different processes thanks to easily replaceable liners
- 20 °C to 1,000 °C within 25 minutes (empty chamber)
- Cooling from 1,000 °C to <100 °C within 60 minutes (empty chamber)
- High vacuum up to 5 x 10-6 mbar
- Oxygen <3.0 ppm with ultra-pure gas N2
Common ApplicationsPEO-604
- Annealing:
- Inert/Atmosphere
- Hydrogen
- High vacuum
- Wet/Dry oxidation
- SiAl/SiAu/SiMo alloying
- Polyimide process
Frontend Semiconductor Production PEO-604Semicon
PEO-604Semicon
Technical data
Dimensions:
1,750 x 835 x 2,355 mm
Weight:
700 kg
Inner quartz tube diameter:
230 mm (9'')
Maximum product temperature:
1,000 °C (optional 1,100 °C)
Options
- Easily exchangeable liners
- High vacuum
- H2 annealing
- Customized quartz ware
- Vacuum pump
- DI water bubbler
